The effect on the gas permeance properties and structural morphology of the presence\nof methyl functional groups in a silica membrane was studied. Membranes were synthesized via\nchemical vapor deposition (CVD) at 650 Degree C and atmospheric pressure using three silicon compounds\nwith differing numbers of methyl- and methoxy-functional groups: tetramethyl orthosilicate (TMOS),\nmethyltrimethoxysilane (MTMOS), and dimethyldimethoxysilane (DMDMOS). The residence time\nof the silica precursors in the CVD process was adjusted for each precursor and optimized in\nterms of gas permeance and ideal gas selectivity criteria������.
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